術語和定義

 Technical terms and definitions

術語
Technical terms

代號
Code

定義
Definitions

腐蝕箔
Etched Foil

－

經過電化學腐蝕擴面，表面未經化成處理的鋁箔
Foils treated by electrochemical etching process before forming process.

化成箔
Formed Foil

－

經電化學陽極氧化處理表面形成致密介質氧化膜的鋁箔
Foils treated by electrochemical anodic oxidation  treatment forming dense medium oxide film on suface.

陽極箔
Anode Foil

鋁電解電容器陽極用的鋁箔
Foils used as an anode of a capacitor.

化成處理
Formation

－

以電化學陽極氧化處理使箔表面產生具有半導電體特性的鋁氧化膜（Al2O3）的過程
The process of electrochemical anode treatment to make the etched foil have semiconductor property aluminium oxide film( Al2O3).

工作電壓
Working voltage

WV

鋁電解電容器額定工作電壓
The rated working voltage for aluminium capacitor.

化成電壓
Formation voltage

Vfe

對腐蝕箔氧化處理過程中施加最后電壓值
Final voltage value applied to etched foil durng forming process.

氧化膜耐電壓
Dielectric withstanding Voltage

Vt

化成箔在達到升壓時間之后3min時的電壓值
Voltage value of formed foil after reaching rise time  3 minutes.

 額定氧化膜耐電壓
Nominal Formation Voltage

Vf

化成箔的氧化膜耐電壓的額定值。
Nominal value of dielectric withstanding voltage.

升壓時間
Rising time

Tr

將額定電流導入化成箔上開始計時，直到電壓達到額定的氧化膜耐電壓值的90%時所需的時間。
Time at which the applied voltage reaches 90% of nominal formation voltage with a specified elctronic current applied to formed foil.

水和處理
Hydration Process

－

將化成箔置于高溫純水中進行煮沸的處理過程
The process of immersion of foil in deionized water at high temperature.

耐水和性
Hydration  Resistance

Tr60

經水和處理后所得的化成箔的升壓時間
The rising time of formed foil after hydration treatment.

純水
Deionized water

－

經離子交換樹脂處理過在25℃時的電阻率大于1.0MΩ•cm的去離子水
The deinized water when resistivity more than 1.0MΩ•cm treated by ion exchange at 25℃.

 低壓化成箔
Low voltage formed foil

－

電解電容器工作電壓小于等于120WV所用的化成鋁箔
Formed foil for elctrolytic capacitors with the working voltage lower than 120WV.

 中高壓化成箔
Medium and high voltage foil

－

電解電容器工作電壓大于等于170WV所用的化成鋁箔
Formed foil for elctrolytic capacitors with the working voltage higer than 170WV.

比容
Capacitance

－

單位面積鋁箔的靜電容量
Capacitance in unit area of alumium foil.